| Description | Certified values (nm) | RM name | RM type | RM no. |
|---|---|---|---|---|
| Ti-Al multilayer 100/250 nm on 100Cr6 steel substrate | 100 | BAM L-100 | CRM | 12 |
|
Thickness standards, tantalum pentoxide film
Calibration of depth-resolving surface analysis |
30 | BCR-261 | CRM | 13 |
|
Thickness standard, silicon dioxide film
NIST traceable |
(2, 4.5, 7.5, 12, 25, 50, ...) | FTS | RM | 3 |
|
Thickness standards, silicon nitride film
NIST traceable |
20 | NFTS | RM | 10 |
|
Thickness standards, tungsten film
For best performance with sonar technology, an oxide layer 100 nm thick is added between the silicon substrate and the metal film, traceable to NIST |
200 | WFTS | RM | 11 |
|
GaAs/Al/As-superlattice
Calibration of depth resolution |
23 | CRM 5201-a | CRM | 32 |
|
SiO2/Si multilayer film reference material
Consist of five layers with SiO2 and Sigrown using r.f. magnetron sputtering method on aSi substrate. The thickness of each layer is certified in units of length via X-ray reflectometry, control the precision of analysis and to regulate measurement condition in depth profile analysis by ion |
20 | NMIJ CRM 5202-a | CRM | 54 |
|
GaAs/AlAs super lattice
The CRM has six-layer-structure and the certified values for the thickness from the second to sixth layer are given; control the precision of analysis and to regulate measurement condition in depth profile analysis by ion sputtering |
9,51 | NMIJ CRM 5203-a | CRM | 55 |
|
Ultrathin silicon dioxide film
3.49 nm (0.19 nm); control the precision of analysis and to regulate measurement condition in depth profile analysis by ion sputtering |
3,49 | NMIJ CRM 5204-a | CRM | 56 |